Haze Removal System
 RAVE
is once again pioneering another breakthrough
in advanced equipment technology with the introduction
of the new Rhazer™ Haze
Removal System.
Haze contamination on photomasks
has become a pervasive and costly problem throughout
the Semiconductor Industry. Recent wet clean and
environmental control techniques have helped to
slow haze formation during wafer stepper exposures,
but show no promise of a haze prevention solution.
The Rhazer™ system does
not prevent haze, but allows the wafer fab to “manage” it!
The Rhazer™ system is designed to reside
in the wafer fab and provide a resident capability
to completely remove haze from both sides of reticles
in less than one working shift. The process is
dry and does not require removal of the pellicle.
Although haze is expected to reform, the Rhazer™ process
causes no damage to the mask absorber materials,
meaning reticles can be cleaned as often as needed
without leaving the control of the fab line.
The Rhazer™ system can be
used to:
Pre-clean masks (providing longer wafer
exposure life)
Re-clean masks during wafer stepper
lithography runs (quickly returning reticles
to the lithography line, increasing line management
flexibility and reducing the need for duplicate
reticles)
Post-clean masks immediately after use
and just before transfer to the reticle stocker
to neutralize haze formation during long term
storage.
Contact RAVE today at sales@ravenano.com to
arrange a Rhazer™ haze removal demonstration.
|
