The nm450 Nanomachining System is the world’s most advanced Photomask repair tool. This revolutionary new system provides mask makers with the capability to remove defects on all known Photomask materials including Binary Chrome, Molybdenum Silicide, Quartz, Carbon patches and foreign contamination. The nm450 is a fourth generation tool who’s reliability and extreme accuracy make it the system of choice for production level 45nm Technology Node mask repairs and more than suitable for 32nm Technology Node mask development. For more system details and process results see our nm450 web page.

The fp650 Femto-Pulse Laser System is the newest addition to RAVE’s highly successful family of Photomask repair tools. With its extraordinary high-speed and precision mask repair capability, the fp650 is today’s most cost effective solution to replace obsolete, older, slower and less capable existing laser and FIB mask repair systems. The fp650 is designed for volume production mask repairs down to the 65nm Technology Node including large and small area image reconstruction and through pellicle repairs. For more system details and process results see our fp650 web page.