Category Archives: Press Releases

New wafer fab clean tool selected by major independent device manufacturer Delray Beach, Florida, September 6, 2011 – Today, RAVE LLC announced receipt of a multi-system purchase order for its Rhazer® haze removal systems from one of the world’s leading … Read more →

Today RAVE N.P., Inc. announced completion of it’s acquisition of the assets and business of Eco-Snow Systems, a member of the Linde Group… Read more →

Today RAVE LLC announced the first international shipment of their advanced fp650™ Femtopulse Laser Photomask Repair System to the captive… Read more →

Today RAVE LLC announced the Final Acceptance of their newest AFM-based 22nm technology node Merlin® Photomask Repair System… Read more →

RAVE LLC announced receipt of a purchase order for its new Rhazer® haze removal system from one of the world’s leading dedicated semiconductor foundries, Chartered Semiconductor Manufacturing Limited, Singapore Read more →

Global semiconductor wafer fabs are struggling with an increasingly serious and costly lithography problem. Wafer stepper exposures initiate the growth of crystalline defect contamination on reticles commonly known as “Haze.” The haze formation rate reduces the number of wafer exposures and forces lithography line stoppage. Read more →