:: Applications


Our Nanomachining technology delivers Photomask Repair on Quartz materials that has previously not been available.

This is a critical component for manufacturing cost reduction and lead time predictability. Currently alternating phase shift masks are used on a single level in the semiconductor lithography process. APSM is the most difficult to produce of all masks currently offered commercially; therefore, it is the most expensive, time consuming and least predictable. We excel in this arena!

Additionally, RAVE has exhibited the capability of performing all other subtractive repair functions required in advanced photomask manufacturing on a variety of materials.

• Molybdenum Silicide on Quartz, used as the substrate for the Embedded Attenuated Phase Shift mask.
• Nanometer accuracy repairs performed using the conventional Focused Ion Beam technology (FIB) can be imprecise and leave material in unintended areas. The RAVE nm650 excels in trimming or removing Carbon Patch materials, thereby "repairing" the initial repair.
• Binary Chrome repair is easily achievable on the RAVE system.