news
  • APPLICATIONS NOTE: EUV Applications for Merlin® and EL-C®

    RAVE LLC in conjunction with several EUV technology champions is developing a backside reticle cleaning process for the removal of embedded debris in the chromium nitride layer used for electrostatic chucking of EUV masks. While standard cleaning methods are most … Read more

  • SEMICON Japan 2013

    December 3-5, 2014 at the Tokyo International Exhibition Center, Ariake, Koto-ku, Tokyo 135-0063.  Visit us at the Canon booth at the supplier exhibition.  Also call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at or near the trade exhibition.

  • Photomask Technology 34th Annual Symposium (BACUS 2014)

    September 16-18, 2014 at the Monterey Conference Center and Monterey Marriott, Monterey, California USA.  Please visit our booth at the supplier exhibition.  Also call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at or near the symposium.

  • Awards

    IBM/RAVE – Best Oral Presentation Award 2012

    At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more

    Barry Hopkins – Lifetime Achievement Award

    In 2009, Barry Hopkins, CEO of RAVE LLC was honored by the worldwide Photomask Industry with the SPIE/BACUS Lifetime Achievement Award. Barry was recognized for his 46 years of dedication to photomask business development and advanced mask making equipment technology.


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