• Photomask & NGL Mask Technology XXI (Photomask Japan 2014)

    April 15-17, 2014 at the Pacifico Yokohama (Annex Hall) Yokohama-City, Kanagawa, Japan.  Visit us at the Canon booth at the supplier exhibition.  Also call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at or near the symposium.

  • 30th European Mask and Lithography Conference (EMLC 2014)

    June 24-25, 2014 at the Hilton Hotel, Dresden, Germany.  Call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at or near the conference.

  • SEMICON West 2014

    July 8-10, 2014 at the Moscone Center, San Francisco, California, USA.  Call 561-330-0411 or e-mail sales@ravenano.com to request a customized private product presentation at or near the trade exhibition.

  • IBM/RAVE – Best Oral Presentation Award 2012

    At the 32nd Annual SPIE Photomask Technology Symposium (BACUS 2012) in Monterey, California, Emily E. Gallagher, Gregory R. McIntyre and Mark Lawliss of IBM Corporation along with Tod E. Robinson, Senior Applications Engineer, Ronald R. Bozak, Applications Manager and Roy … Read more

  • Barry Hopkins – Lifetime Achievement Award

    In 2009, Barry Hopkins, CEO of RAVE LLC was honored by the worldwide Photomask Industry with the SPIE/BACUS Lifetime Achievement Award. Barry was recognized for his 49 years of dedication to photomask business development and advanced mask making equipment technology.


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